B&A offers a variety of high performance, collimated UV Exposure Systems. These systems are used for patterning as well as enhancing many of the photolithographic processes used by the Microelectronics Industry.
These exposure systems are designed for use in production as well as R&D applications. Near, Mid and Deep UV systems are available with a variety of standard and optional features including beam sizes to 16" (400mm), intensity controlling powersupplies, and up to 2,000W capability.

The System's Optics...
The system's exposure optics employ a proven, high performance optic train that employs an elliptical reflector, dielectric heat removing primary and secondary mirrors, a multi-element optical integrator system and collimating optics. The optical integrator system produces non-coherent radiation that virtually eliminates the detrimental effects of diffraction. These high intensity systems can resolve fine structures even in thick resist.

 Features and Options  Typical Applications
  • High Efficiency, Uniform, Lightsource
  • SystemsNear, Mid and Deep UV Versions
  • 200W to 2,000W Systems
  • Intensity Controlling Powersupply Systems
  • Shutter Controller
  • High Rel, Low Maintenance Design
  • Excellent Documentation
  • Ultra Clean Robotic Handling (optional)
  • Photoresist Patterning
  • Photoresist Stabilization
  • Edge Bead Exposure
  • Photoresist Modification
  • Image Reversal
  • PCM Processes
UV Lightsource Photo2 LS Collage

TYPICAL TECHNICAL SPECIFICATIONS
   Near UV Systems  Deep UV Systems
 Beam Sizes
 100mm - 400mm
100mm - 200mm
 Beam Divergences
 2.6 deg. - 1.3 deg.
2.6 deg. - 2.3 deg.
 Beam Uniformity
Standard Systems
 Diameters +/- 5%
Squares +/- 6%
Diameters +/- 5%
Squares +/- 6%
 Beam Uniformity
Hi-Uniformity Systems
 Diameters +/- 2.5%
Squares +/- 3.5%
Diameters +/- 2.5%
Squares +/- 3.5%
  Beam Spectrum
  340nm - 450nm
 220nm - 260nm
240nm - 275nm
 Intensity @ 200W, 100mm Dia.
10 mW/cm2 (UV365)
20 mW/cm2 (UV400)
 NA
 Intensity @ 350W, 100mm Dia.
18 mW/cm2 (UV365)
36 mW/cm2 (UV400)
 NA
 Intensity @ 500W, 100mm Dia.
25 mW/cm2 (UV365)
50 mW/cm2 (UV400)
10 - 12 mW/cm2 (DUV220)
16 - 18 mW/cm2 (DUV260)
 Intensity @ 1,000W, 100mm Dia.
50 mW/cm2 (UV365)
100 mW/cm2 (UV400)
20 - 24 mW/cm2 (DUV220)
30 - 34 mW/cm2 (DUV260)
  Intensity @ 2,000W, 100mm Dia.
100 mW/cm2 (UV365)
200 mW/cm2 (UV400)
40 - 44 mW/cm2 (DUV220)
60 - 64 mW/cm2 (DUV260)

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B&A Home Page

Optical Components

Custom Optics

Optical Filters

Optical Filters/Coatings

Glass/Metal Reflectors

UV Mirrors

Collimating Lenses

Arc Lamps

Arc Lamp Powersupplies

UV Powermeters

  Technical Consulting