UV LIGHTSOURCES AND EXPOSURE SYSTEMS

B&A offers a variety of high performance, collimated UV Lightsources and UV Exposure Systems. These systems are used for fine line patterning as well as the enhancement of many UV photolithography processes employed by the Microelectronics Industry.
These UV systems are designed for production use as well as R&D applications. Near, Mid, and Deep UV systems are available with a variety of standard and optional features including beam sizes to 16" (400mm), intensity controlling powersupplies, and up to 5,000W capability.

The System's Optics...
The system's UV optics employ a proven, high performance optic train that include an elliptical reflector, dielectric heat removing primary and secondary mirrors, a multi-element optical integrator system and collimating optics. The system's optical integrator system produces uniformity and non-coherent radiation that virtually eliminates the detrimental effects of diffraction. These high intensity systems can resolve fine structures even in thick photosensitive materials.

 Features and Options  Typical Applications
  • Uniform, Lightsource Systems
  • Near, Mid and Deep UV Versions
  • 200W to 5,000W Systems
  • Intensity Controlling Powersupply Systems
  • Shutter Controller
  • Hi-Rel, Low Maintenance Design
  • Excellent Documentation

 
  • Photoresist Patterning
  • Photoresist Stabilization
  • Edge Bead Exposure
  • Photoresist Modification
  • Image Reversal
  • Polymer Research
  • PCM Processes
12 Square UV Exposure System UV Exposure System with Rotation Folded Version LS
                        Large Area Version              Hi-Power Version              Integrated System         Folded Beam Version
                                                                                                      3D Lightsource Layout   Typical "F" Lightsource Layout
TYPICAL TECHNICAL SPECIFICATIONS
   Near UV Systems  Deep UV Systems
  Available Beam Sizes
 100mm - 400mm
  150mm - 200mm
 Beam Divergence
 2.6 deg. - 1.3 deg.
  2.3 deg. - 1.3 deg.
 Beam Uniformity - Standard Systems
 Diameters +/- 5%
 Squares +/- 6%
 Diameters +/- 5%
 Squares +/- 6%
 Beam Spectrum
 340nm - 450nm
 220nm - 260nm
 240nm - 275nm
 Intensity @ 200W (100mm Dia.)
 16 mW/cm2 (UV365)
 32 mW/cm2 (UV400)
 NA
 Intensity @ 350W (150mm Dia.)
 25 mW/cm2 (UV365)
 50 mW/cm2 (UV400)
 NA
 Intensity @ 500W (150mm Dia.)
 40 mW/cm2 (UV365)
 80 mW/cm2 (UV400)
 20 mW/cm2 (DUV220)
 30 mW/cm2 (DUV260)
 Intensity @ 1,000W (150mm Dia.)
 50 mW/cm2 (UV365)
 100 mW/cm2 (UV400)
 40 mW/cm2 (DUV220)
 60 mW/cm2 (DUV260)
 Intensity @ 2,000W (200mm Dia.)
 70 mW/cm2 (UV365)
 150 mW/cm2 (UV400)
 25 mW/cm2 (DUV220)
 37 mW/cm2 (DUV260)

Go To....

Go To....
B&A Home Page
UV Lightsource Systems
 UV Calibration Systems 
Flood Exposure Systems
UV LED Sources
 UV Measurement Systems
USED Lightsources
 Solar Simulator Systems  Powersupply Systems

For additional technical information and pricing contact us at...

Tel:  (408) 988-5861
Fax: (408) 982-9513 and (408) 249-5037
Email: sales@bachur-n-associates.com