UV LIGHTSOURCES AND EXPOSURE SYSTEMS

B&A offers a variety of high performance, collimated UV Lightsources and UV Exposure Systems. These systems are used for fine line patterning as well as the enhancement of many UV photolithography processes employed by the Microelectronics Industry.
These UV systems are designed for production use as well as R&D applications. Near, Mid, and Deep UV systems are available with a variety of standard and optional features including beam sizes to 16" (400mm), intensity controlling powersupplies, and up to 5,000W capability.

The System's Optics...
The system's UV optics employ a proven, high performance optic train that include an elliptical reflector, dielectric heat removing primary and secondary mirrors, a multi-element optical integrator system and collimating optics. The system's optical integrator system produces uniformity and non-coherent radiation that virtually eliminates the detrimental effects of diffraction. These high intensity systems can resolve fine structures even in thick photosensitive materials.

 Features and Options  Typical Applications
  • Uniform, Lightsource Systems
  • Near, Mid and Deep UV Versions
  • 200W to 5,000W Systems
  • Intensity Controlling Powersupply Systems
  • Shutter Controller
  • Hi-Rel, Low Maintenance Design
  • Excellent Documentation

 
  • Photoresist Patterning
  • Photoresist Stabilization
  • Edge Bead Exposure
  • Photoresist Modification
  • Image Reversal
  • Polymer Research
  • PCM Processes
12 Square UV Exposure SystemUV Exposure System with Rotation
Large Area System           Standard Lightsource      High Power Lightsource   Lightsource with Tooling       Calibration Lightsource

Typical LS System
A Typical 100mm/150mm Exposure System
TYPICAL TECHNICAL SPECIFICATIONS
   Near UV Systems  Deep UV Systems
  Available Beam Sizes
 100mm - 400mm
  100mm - 200mm
 Beam Divergence
 2.6 deg. - 1.3 deg.
  2.6 deg. - 2.3 deg.
 Beam Uniformity - Standard Systems
 Diameters +/- 5%
 Squares +/- 6%
 Diameters +/- 5%
 Squares +/- 6%
 Beam - High Uniformity Systems
 Diameters +/- 2.5%
 Squares +/- 3.5%
 Diameters +/- 2.5%
 Squares +/- 3.5%
  Beam Spectrum
 340nm - 450nm
 220nm - 260nm
 240nm - 275nm
 Intensity @ 200W (100mm Dia.)
 16 mW/cm2 (UV365)
 34 mW/cm2 (UV400)
 NA
 Intensity @ 350W (100mm Dia.)
 28 mW/cm2 (UV365)
 60 mW/cm2 (UV400)
 NA
 Intensity @ 500W (100mm Dia.)
 40 mW/cm2 (UV365)
 85 mW/cm2 (UV400)
 17 mW/cm2 (DUV220)
 20 mW/cm2 (DUV260)
 Intensity @ 1,000W (100mm Dia.)
 77 mW/cm2 (UV365)
 170 mW/cm2 (UV400)
 30 mW/cm2 (DUV220)
 36 mW/cm2 (DUV260)
 Intensity @ 2,000W (100mm Dia.)
 150 mW/cm2 (UV365)
 320 mW/cm2 (UV400)
 60 mW/cm2 (DUV220)
 70 mW/cm2 (DUV260)

Go To....
B&A Home Page
UV Mirrors
 Arc Lamps
Glass/Metal Reflectors
Flood Exposure Systems
Powersupply Systems
 Collimation Lenses Optical Components
USED Lightsources
Chucks, Mask Holders
UV Measurement Sys
 Optical Filters

For additional technical information and pricing contact us at...

Tel:  (408) 988-5861
Fax: (408) 249-5037
Email: sales@bachur-n-associates.com